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<rss xmlns:dc="http://purl.org/dc/elements/1.1/" version="2.0"><channel><atom:link rel="hub" href="http://tumblr.superfeedr.com/" xmlns:atom="http://www.w3.org/2005/Atom"/><description>Adenike Adebiyi writes here about the business of inventing and patenting and reblogs and likes anything else that amuses her.</description><title>Dewipat Inc.</title><generator>Tumblr (3.0; @dewipat)</generator><link>http://dewipat.com/</link><item><title>Should you obtain a patent for your invention?</title><description>&lt;p&gt;Patents are popular nowadays. If you invent something “cool” and tell people about it, you’ll likely receive advice that filing for a patent for your invention is the prudent thing to do. However, should you do it?&lt;/p&gt;
&lt;div&gt;
&lt;p&gt;Before I address the question, I’d like to propose the idea that patent is a luxury. To do this, it’d be best if we both understand what luxury is. From the New Oxford American Dictionary, luxury means “an inessential, desirable item that is expensive or difficult to obtain.” “Inessential” means “not absolutely necessary.” For example, a 2.0 carat weight diamond is a luxury. It’s desirable, it’s expensive, it’s difficult to obtain, and it’s not essential to life.&lt;!-- more --&gt;&lt;/p&gt;
&lt;p&gt;Therefore, when I say that patent is a luxury, I mean that a patent is a desirable item that is expensive or difficult to obtain and that is not absolutely necessary. With this working definition, we can now explore why patent is a luxury.&lt;/p&gt;
&lt;p&gt;If you obtain a patent for your invention in the US, for a limited time, you can exclude others from making, using, offering for sale, or selling your invention in the US. You can even prevent people from importing your invention into the US. For competitive advantage, a patent is therefore very desirable. You can license your patent to others and thereby make money from your patent. You can be the exclusive maker or user of your invention and thus monopolize the market. However, I should mention that a patent will not grant you the right to make or use your invention. It may be necessary for you to obtain licenses from others in order to actually make or use your invention.&lt;/p&gt;
&lt;p&gt;On the subject of patent costs, consider a patent application describing and claiming an invention of minimal complexity. Assume that the patent application will be filed in the US and prosecution of the patent application will be smooth, e.g., the patent application will be subject to only two office actions prior to allowance. Then, the patent costs might look like what is shown in the table below. Note that the patent office fees are stated for a small entity, such as an individual. The fees are more exorbitant (e.g., double) for a large entity. Also, some patent practitioner charges are not indicated in the table, e.g., charges for filing the application, charges for filing information disclosure statements, and charges for reviewing the application after allowance and prior to grant of a patent. These omitted charges can easily add another $1,000 to the patent costs. At the low end, it’d cost roughly $15,000 to obtain and maintain a patent. &lt;/p&gt;
&lt;p&gt;&lt;img src="http://media.tumblr.com/tumblr_lzsan4rZDx1r7z568.png"/&gt;&lt;/p&gt;
&lt;p&gt;The patent application will be subjected to a rigorous examination at the patent office. To understand the difficulty in obtaining a patent, it will help to perceive the examiner as being happiest when he can reject the claims in the application for one reason or another. In some cases, it will be possible to amend the claims or point out errors in the examiner’s reasons for rejecting the claims. Often, the examiner will come back with new rejections, which may require additional amendments to the claims and definitely will require more arguments. This can get complicated if the invention is in a crowded field. At the end of the day, it may be impossible to overcome the rejections, in which case the patent application would have to be abandoned. Or, it may be necessary to appeal the case.&lt;/p&gt;
&lt;p&gt;The idea of a patent not being absolutely necessary may be understood by considering the worst that could happen if you don’t apply for a patent for your invention. There are two things that can happen. The first thing is that somebody might practice your invention and not compensate you for it. The second thing is that somebody might come up with an invention similar to yours, patent it, and prevent you from practicing your invention or force you to take a license to practice your invention. Note that none of these two things are life threatening. Also, the second thing can be prevented by making your invention public as soon as you decide that you will not seek a patent.&lt;/p&gt;
&lt;p&gt;Now, back to the question. Should you obtain a patent for your invention? It depends on how much money you have to expend on obtaining a patent and whether you care if other people practice your invention without compensating you for it.&lt;/p&gt;
&lt;/div&gt;</description><link>http://dewipat.com/post/17929259047</link><guid>http://dewipat.com/post/17929259047</guid><pubDate>Sun, 19 Feb 2012 22:39:00 -0600</pubDate><category>patent cost</category><category>inventor</category></item><item><title>Seven Sins: Intellectual Property Mistakes Start-Up Technology Companies Should Avoid</title><description>&lt;a href="http://www.fenwick.com/docstore/publications/ip/2010_seven_sins.pdf"&gt;Seven Sins: Intellectual Property Mistakes Start-Up Technology Companies Should Avoid&lt;/a&gt;: &lt;p&gt;The start-up company often is an exciting and fast moving entity. However, without attention to detail involving intellectual property encompassed within the company product and/or service, the time, effort and sweat equity invested in getting that product and/or service to market can slow down, or even halt, company growth. This article looks at seven intellectual property mistakes start-up companies make and tips to navigate and address the issues to help ensure a solid foundation for long term growth.&lt;/p&gt;
&lt;p class="p1"&gt;(From WIPO SMEs Newsletter February 2012.)&lt;/p&gt;</description><link>http://dewipat.com/post/17786697840</link><guid>http://dewipat.com/post/17786697840</guid><pubDate>Fri, 17 Feb 2012 16:42:00 -0600</pubDate><category>ip management</category></item><item><title>Modern Inventions</title><description>&lt;p&gt;1-Click, a method and system of shopping on the Internet, is an example of what humans are inventing and patenting in the 21st century. Presumably, humans have already solved all the hard problems. Now, humans want a speedier way of eating the fruits of their labors. I’ll explain the gist of 1-Click in English, i.e., as opposed to in patent language, which can be quite hard to understand. (For those interested in cerebral gymnastics, please see U.S. Patent No. 5,960,411.)&lt;!-- more --&gt;&lt;/p&gt;
&lt;p&gt;&lt;strong&gt;The gist …&lt;/strong&gt;&lt;/p&gt;
&lt;p&gt;To order an item,&lt;br/&gt;sit in front of a computer,&lt;br/&gt;make the computer show you the item you want to order, and&lt;br/&gt;do  only one thing, e.g., click on a button or talk to the computer, to  send some information about you and a request to order the item to a  server.&lt;/p&gt;
&lt;p&gt;Without you having to do anything else,&lt;br/&gt;the server will receive your request,&lt;br/&gt;the server will retrieve some more information about you,&lt;br/&gt;the server will create an order to buy the item you asked for, and&lt;br/&gt;the server will fulfill the order it created.&lt;/p&gt;</description><link>http://dewipat.com/post/17643888383</link><guid>http://dewipat.com/post/17643888383</guid><pubDate>Tue, 14 Feb 2012 22:35:00 -0600</pubDate><category>patent</category><category>web</category><category>retail</category><category>Amazon</category></item><item><title>PTO's First Fee-Setting Proposal Asks for Big Hikes in Current Rates, High Post-Grant Fees</title><description>&lt;a href="http://www.bna.com/ptos-first-feesetting-n12884907779/"&gt;PTO's First Fee-Setting Proposal Asks for Big Hikes in Current Rates, High Post-Grant Fees&lt;/a&gt;: &lt;p&gt;Combined filing, search, and examination fees will rise from  $1,250 to $1,840. RCE fee will rise from $930 to $1,700. Notice of  appeal fee will rise to $1,500. Appeal to cost an additional $2,500.  Total cost of appeal will rise from $1,240 to $4,000. $5,180 to process  supplemental examination. $16,120 for subsequent ex parte reexamination.  Post-grant procedures and business method challenges to begin at  $35,800 for a patent with less than 20 claims, to $125,300 for a patent  with 61-70 claims, with $35,800 more every 10 claims after that, and so  on.&lt;/p&gt;</description><link>http://dewipat.com/post/17667902038</link><guid>http://dewipat.com/post/17667902038</guid><pubDate>Sat, 11 Feb 2012 15:33:00 -0600</pubDate><category>patent cost</category><category>uspto</category></item><item><title>PCT Newsletter 2012-02</title><description>&lt;a href="http://www.wipo.int/edocs/pctndocs/en/2012/pct_news_2012_02.pdf"&gt;PCT Newsletter 2012-02&lt;/a&gt;: &lt;p&gt;In this issue, you’ll find practical advice for changing the applicant  in a PCT application. If the 30-month deadline for national phase entry  has not passed, file a request to record the change with the IB under &lt;a href="http://www.wipo.int/pct/en/texts/rules/r92bis.htm" title="PCT Rule 92bis"&gt;PCT Rule 92bis&lt;/a&gt;.  If the 30-month deadline has passed, the change of applicant would have  to be implemented at the national level according to national laws.&lt;/p&gt;</description><link>http://dewipat.com/post/17667954462</link><guid>http://dewipat.com/post/17667954462</guid><pubDate>Thu, 09 Feb 2012 12:58:00 -0600</pubDate><category>pct</category></item><item><title>US Pat No 8110279</title><description>&lt;a href="http://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20120207&amp;DB=EPODOC&amp;locale=en_EP&amp;CC=US&amp;NR=8110279B2&amp;KC=B2&amp;ND=3"&gt;US Pat No 8110279&lt;/a&gt;: &lt;p&gt;&lt;span&gt;Method for improving the edge strength of tempered glass sheet articles, Shashidhar et al., US 8110279&lt;/span&gt;&lt;/p&gt;
&lt;p&gt;A tempered glass sheet article includes a glass sheet having a thickness t, at least one edge, and at least one surface. The at least one edge is connected to the at least one surface by an edge-to-surface corner. The edge-to-surface corner is rounded with a radius r and has a surface compression that is at least 78% of a surface compression measured at or near a center of the at least one surface.&lt;/p&gt;
&lt;p&gt;(174) The patent application of US8110279 was drafted by the Dewipat Scribe in 2010.&lt;/p&gt;</description><link>http://dewipat.com/post/17711592940</link><guid>http://dewipat.com/post/17711592940</guid><pubDate>Tue, 07 Feb 2012 00:00:00 -0600</pubDate><category>glass</category><category>work log</category></item><item><title>US Pat No 8110277</title><description>&lt;a href="http://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20120207&amp;DB=EPODOC&amp;locale=en_EP&amp;CC=US&amp;NR=8110277B2&amp;KC=B2&amp;ND=3"&gt;US Pat No 8110277&lt;/a&gt;: &lt;p&gt;Fused silica blank and method of forming fused silica plate from the same, Burdette et al., US 8110277&lt;/p&gt;
&lt;p&gt;A method of making a fused silica plate includes providing a fused silica blank having a length, a longitudinal axis, and an outer diameter. The method further includes forming a slot in the fused silica blank which extends from the outer diameter to a location at or offset from a center of the fused silica blank and is substantially parallel to the longitudinal axis of the fused silica blank. The slot is defined by a concave surface located at or offset from the center of the fused silica blank, a first side surface extending between a first edge of the concave surface and the outer diameter of the fused silica blank, and a second side surface extending between a second edge of the concave surface and the outer diameter of the fused silica blank. At least one of the first and second side surfaces are connected to the concave surface by a chamfered surface. The method further includes rolling out the fused silica blank having the slot to form a fused silica plate.&lt;/p&gt;
&lt;p&gt;(136) The patent application of US 8110277 was drafted by the Dewipat Scribe in 2007 and prosecuted by the Dewipat Defender in 2011.&lt;/p&gt;</description><link>http://dewipat.com/post/17717915165</link><guid>http://dewipat.com/post/17717915165</guid><pubDate>Tue, 07 Feb 2012 00:00:00 -0600</pubDate><category>fused silica</category><category>work log</category></item><item><title>Patent Prosecution Highway for PCT</title><description>&lt;p&gt;A Patent Prosecution Highway (“PPH”) request can be filed at the USPTO  in any national stage application, regardless of the nature of the  priority claim in the parent Patent Cooperation Treaty (“PCT”)  application, provided there is a PPH agreement between the USPTO and the  International Searching Authority (“ISA”) used in the PCT  application. Presently, there are PPH agreements between the USPTO and  each of the European Patent Office, the Nordic Patent Institute, and the  intellectual property offices in Australia, Austria, China, Finland,  Japan, South Korea, Russia, Spain, and Sweden.&lt;/p&gt;</description><link>http://dewipat.com/post/17679804850</link><guid>http://dewipat.com/post/17679804850</guid><pubDate>Fri, 20 Jan 2012 09:16:00 -0600</pubDate><category>accelerated examination</category><category>patent practice</category><category>pph</category><category>pct</category></item><item><title>Expediting Patent Examination</title><description>&lt;div&gt;
&lt;div&gt;
&lt;p&gt;The U.S. Patent and Trademark Office (USPTO) offers several programs for expediting patent examination. Here are some examples:&lt;/p&gt;
&lt;p&gt;&lt;strong&gt;Prioritized Examination (Track I)&lt;/strong&gt;&lt;/p&gt;
&lt;p&gt;Track I can be initiated (i) at the time of filing a patent  application, (ii) at the time of filing a request for continued  examination in a patent application, or (iii) after filing a request for  continued examination (RCE) in a patent application but before  receiving a first office action after the filing of the RCE.  Non-provisional utility or plant applications filed under 35 USC 111(a)  are eligible.&lt;!-- more --&gt;&lt;/p&gt;
&lt;p&gt;&lt;strong&gt;Accelerated Examination Program&lt;/strong&gt;&lt;/p&gt;
&lt;p&gt;Accelerated examination program at the time when a patent application  is filed. Only non-reissue utility or design applications filed under  35 USC 111(a) are eligible. Guaranteed time period for making a final  decision in the application is 12 months.&lt;/p&gt;
&lt;p&gt;&lt;strong&gt;Patent Prosecution Highway&lt;/strong&gt;&lt;/p&gt;
&lt;p&gt;Patent prosecution highway (PPH) can be initiated before substantive  examination of a patent application has begun. The types of US  applications eligible for PPH are:&lt;/p&gt;
&lt;ul&gt;&lt;li&gt;A Paris convention application that either (i) validly claims  priority under 35 USC 119(a) and 37 CFR 1.55 to one or more applications  filed in an OFF, or (ii) validly claims priority under 35 USC  119(a)/365(a) to a PCT application that does not contain priority  claims.&lt;/li&gt;
&lt;li&gt;A national stage application based on a PCT application, where the  PCT application (i) validly claims priority under 35 USC 365(b) to an  application in an OFF, or (ii) validly claims priority under 35 USC  365(b) to a PCT application that does not contain priority claims, or  (iii) does not contain priority claims.&lt;/li&gt;
&lt;li&gt;A so-called bypass application filed under 35 USC 111(a) that  validly claims benefit under 35 USC 120 of a PCT application, where the  PCT application claims priority under 35 USC 365(b) to an application  filed in an OFF, or (ii) validly claims priority under 35 USC 365(b) to a  PCT application that does not contain priority claims, or (iii) does  not contain priority claims.&lt;/li&gt;
&lt;/ul&gt;&lt;p&gt;OFF stands for Office of First Filing. Presently, OFF can be  Australia, Austrian Patent Office, Canada, Denmark, European Patent  Office, Finland, Germany, Hungary, Japan, South Korea, Russia,  Singapore, Spanish Patent and Trademark Office, and United Kingdom. (&lt;a href="http://www.uspto.gov/patents/init_events/pph/index.jsp" title="Patent Prosecution Highway"&gt;More at the USPTO.&lt;/a&gt;)&lt;/p&gt;
&lt;p&gt;&lt;strong&gt;Petition to Make Special&lt;/strong&gt;&lt;/p&gt;
&lt;p&gt;A petition to make special can be made if (a) the basis for the  petition is that the applicant is 65 years of age or older, (b) the  applicant is such that s/he may not be available to assist with  prosecution of the application if the application were to run its normal  course, or (c) the invention will materially (i) enhance the quality of  the environment, (ii) contribute to the development or conservation of  energy resources, or (iii) contribute to countering terrorism.&lt;/p&gt;
&lt;/div&gt;
&lt;/div&gt;</description><link>http://dewipat.com/post/17679706743</link><guid>http://dewipat.com/post/17679706743</guid><pubDate>Fri, 13 Jan 2012 11:43:00 -0600</pubDate><category>accelerated examination</category><category>pph</category><category>patent practice</category></item><item><title>A day made of glass</title><description>&lt;iframe width="400" height="225" src="http://www.youtube.com/embed/6Cf7IL_eZ38?wmode=transparent&amp;autohide=1&amp;egm=0&amp;hd=1&amp;iv_load_policy=3&amp;modestbranding=1&amp;rel=0&amp;showinfo=0&amp;showsearch=0" frameborder="0" allowfullscreen&gt;&lt;/iframe&gt;&lt;br/&gt;&lt;br/&gt;&lt;p&gt;A day made of glass&lt;/p&gt;</description><link>http://dewipat.com/post/17682561207</link><guid>http://dewipat.com/post/17682561207</guid><pubDate>Sat, 31 Dec 2011 11:12:00 -0600</pubDate><category>corning</category><category>glass</category><category>futuristic</category></item><item><title>What makes an inventor?</title><description>&lt;iframe width="400" height="300" src="http://www.youtube.com/embed/3bweRZ666LA?wmode=transparent&amp;autohide=1&amp;egm=0&amp;hd=1&amp;iv_load_policy=3&amp;modestbranding=1&amp;rel=0&amp;showinfo=0&amp;showsearch=0" frameborder="0" allowfullscreen&gt;&lt;/iframe&gt;&lt;br/&gt;&lt;br/&gt;&lt;p&gt;What makes an inventor?&lt;/p&gt;</description><link>http://dewipat.com/post/17682744293</link><guid>http://dewipat.com/post/17682744293</guid><pubDate>Mon, 26 Dec 2011 20:25:00 -0600</pubDate><category>inventor</category></item><item><title>New use of old device</title><description>&lt;div&gt;
&lt;div&gt;
&lt;p&gt;Every now and then, people will discover a new use for an old or  known device and wonder if they have invented something that could be  patented. The notes below might help.&lt;/p&gt;
&lt;p&gt;—Mere application of an old device to a new use does not constitute an invention. &lt;em&gt;Exer-Genie, Inc. v. MacDonald&lt;/em&gt;, 453 F.2d 133 (9th Cir. 1972).&lt;/p&gt;
&lt;p&gt;—Adaptation of an old device to a new use may constitute invention  especially where the device is transferred from one art to another. But  where such adaptation—with or without such transfer—is the product of  mere mechanical skill, it does not constitute invention. &lt;em&gt;Id, &lt;/em&gt;453 F.2d at 133.&lt;!-- more --&gt;&lt;/p&gt;
&lt;p&gt;—The grant of a patent on a machine cannot be predicated on a new use of the machine. &lt;em&gt;In re Schreiber&lt;/em&gt;, 128 F.3d 1477 (Fed. Cir. 1997).&lt;/p&gt;
&lt;p&gt;—The discovery of a new use of a known device does not render the  device patentable per se. The reason, however, is not “inherency”; it is  that the device is already known to the public, and cannot be removed  from the public. The new use can of course be claimed as a method of  use. &lt;em&gt;Id.&lt;/em&gt;, 128 F.3d at 1481.&lt;/p&gt;
&lt;p&gt;Thus, an adapted old device may be patentable if the adaptation  involves more than mere mechanical skill. If the new use of the old  device does not require significant adaption of the old device, then the  new use may be claimed as a method of use. However, there would still  be the hurdle of showing that the method of use is not obvious.&lt;/p&gt;
&lt;/div&gt;
&lt;/div&gt;</description><link>http://dewipat.com/post/17663674268</link><guid>http://dewipat.com/post/17663674268</guid><pubDate>Fri, 16 Dec 2011 16:02:00 -0600</pubDate><category>patent practice</category></item><item><title>Buyer beware: IP is not just another asset</title><description>&lt;a href="http://www.nortonrose.com/ca/en/knowledge/publications/60794/ip-monitor-buyer-beware-ip-is-not-just-another-asset"&gt;Buyer beware: IP is not just another asset&lt;/a&gt;: &lt;p&gt;There is no doubt that trade-marks, brands, and other trade indicia and  intellectual property (“IP”) can be one of a company’s most valuable  assets. That does not mean that trade-marks and other IP can be treated  like any other asset in the context of an acquisition.&lt;/p&gt;</description><link>http://dewipat.com/post/17683584267</link><guid>http://dewipat.com/post/17683584267</guid><pubDate>Fri, 16 Dec 2011 10:53:00 -0600</pubDate><category>acquisition</category><category>trademarks</category></item><item><title>End of Inventor's Notebook as Patent Instrument</title><description>&lt;p&gt;It used to be that inventors intending to file for patents in the United States were admonished to be meticulous about recording their inventions in hardbound notebooks. The entries had to be dated and signed with a witness on hand. No more. On 16 March 2013, the United States will no longer be a first-to-invent country. For the same claimed invention, the applicant who makes it first to the patent office will get the right of priority. This can be good news or bad news depending on how you look at it. Some say that the little guy may not have the resources to get to the patent office on time. On the other hand, the first-to-file system will simplify resolution of effective filing dates of patent applications and patents and would align the United States with much of the rest of the world.&lt;!-- more --&gt;&lt;/p&gt;
&lt;p&gt;Under the first-to-invent system, right of priority in two applications or an application and a patent claiming the same invention was determined in an interference proceeding. This is where an inventor’s notebook may come in handy in showing date of invention. With the first-to-file system, there will be no need for interference proceeding. As a matter of fact, in anticipation of the end of interference proceeding, the Board of Patent Appeal and Interferences now has a new name, i.e., Patent Trial and Appeal Board. Although, it’s not clear what would be done in the very unlikely event that two applications or an application and patent claiming the same invention were filed on exactly the same day and at exactly the same time.&lt;/p&gt;
&lt;p&gt;The change to a first-to-file system is part of the America Invents Act signed into law by President Obama on 16 September 2011.&lt;/p&gt;</description><link>http://dewipat.com/post/17663433744</link><guid>http://dewipat.com/post/17663433744</guid><pubDate>Thu, 15 Dec 2011 19:13:00 -0600</pubDate><category>America Invents Act</category><category>inventor's notebook</category></item><item><title>What best mode?</title><description>&lt;p&gt;With signing of the America Invents Act (H.R. 1246) on 16 September  2011, failure to disclose the best mode in a patent specification will  no longer form a basis on which any claim of the patent may be canceled  or held invalid or unenforceable. However, the patent specification is  still “required” to disclose the best mode of carrying out the  invention.&lt;/p&gt;</description><link>http://dewipat.com/post/17684498170</link><guid>http://dewipat.com/post/17684498170</guid><pubDate>Wed, 14 Dec 2011 11:00:00 -0600</pubDate><category>America Invents Act</category></item><item><title>PCT Newsletter 2011-12</title><description>&lt;a href="http://www.wipo.int/edocs/pctndocs/en/2011/pct_news_2011_12.pdf"&gt;PCT Newsletter 2011-12&lt;/a&gt;: &lt;p&gt;Availability of patent applications for licensing to be made available on Patentscope starting in January 2012.&lt;/p&gt;</description><link>http://dewipat.com/post/17742143150</link><guid>http://dewipat.com/post/17742143150</guid><pubDate>Tue, 13 Dec 2011 12:29:00 -0600</pubDate><category>pct</category></item><item><title>Patent Specification</title><description>&lt;div&gt;
&lt;div&gt;
&lt;p&gt;Independent inventors are often very surprised when a patent  practitioner tells them it’d cost a couple of thousands to prepare a  patent application. I suppose they had gone to the practitioner with the  presumption that preparing a patent application is all about filling  out forms. No, it’s not all about filling out forms. You’ll get to the  forms eventually, but not before shedding a large quantity of brain  cells. Perhaps the patenting community is at fault. What we call a  patent application should really be called a patent specification or  specification, which would give the impression of something more than  filled-out forms.&lt;/p&gt;
&lt;p&gt;By the way, the Oxford English Dictionary has an entry for specification:&lt;/p&gt;
&lt;blockquote&gt;
&lt;p&gt;A document, drawn up by the applicant for a patent and submitted to  the proper authority, giving an explicit description of the nature,  details, construction, and use of an invention.&lt;/p&gt;
&lt;/blockquote&gt;
&lt;/div&gt;
&lt;/div&gt;</description><link>http://dewipat.com/post/17987373511</link><guid>http://dewipat.com/post/17987373511</guid><pubDate>Tue, 13 Dec 2011 07:01:00 -0600</pubDate><category>patent drafting</category><category>inventor</category></item><item><title>US Pat No 8067883</title><description>&lt;a href="http://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20111129&amp;DB=worldwide.espacenet.com&amp;locale=en_EP&amp;CC=US&amp;NR=8067883B2&amp;KC=B2&amp;ND=6"&gt;US Pat No 8067883&lt;/a&gt;: &lt;p&gt;Frit sealing of large device, Wang, &lt;span class="s1"&gt;&lt;a href="http://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20111129&amp;DB=worldwide.espacenet.com&amp;locale=en_EP&amp;CC=US&amp;NR=8067883B2&amp;KC=B2&amp;ND=6"&gt;US8067883&lt;/a&gt;&lt;/span&gt;&lt;/p&gt;
&lt;p class="p1"&gt;A hermetically sealed device comprises a spacing unit and a resistive heating element desirably having a closed-loop structure and process for hermetically sealing a device by using such heating element and spacing unit. The frit can form multiple closed-loops to prevent crack propagation. The heating element can be advantageously made of a metal such as Invar® and/or Kovar®. The invention enables hermetic frit sealing with low residual stress in the seal for large-area displays. The invention is particularly advantageous for hermetic sealing of OLED display devices having a large area, such as those above 10 inches (25 cm).&lt;/p&gt;
&lt;p class="p1"&gt;(190) The patent application of US 8067883 was prosecuted by the Dewipat Defender from 2010 to 2011.&lt;/p&gt;</description><link>http://dewipat.com/post/17718409406</link><guid>http://dewipat.com/post/17718409406</guid><pubDate>Tue, 29 Nov 2011 00:00:00 -0600</pubDate><category>work log</category><category>hermetic seal</category></item><item><title>Unrestrained and promiscuous grants of patents</title><description>&lt;p&gt;&lt;p class="p1"&gt;The United States Patent Office granted &lt;a href="http://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=18360713&amp;DB=worldwide.espacenet.com&amp;locale=en_EP&amp;CC=US&amp;NR=1A&amp;KC=A&amp;ND=4" title="Letters Patent No. 1"&gt;Letters Patent No. 1&lt;/a&gt; to &lt;a href="http://en.wikipedia.org/wiki/John_Ruggles" title="John Ruggles"&gt;John Ruggles&lt;/a&gt; of&lt;a href="http://en.wikipedia.org/wiki/Thomaston,_Maine" title="Thomaston, Maine"&gt;Thomaston, Maine&lt;/a&gt;,  on the 13th day of July, 1836. Ruggles’s patent was not the first  patent granted by the patent office, but it was the first patent granted  by the patent office after the &lt;a href="http://www.uspto.gov/web/offices/ac/ahrpa/opa/kids/special/1836fire.htm" title="Great Fire of 1836"&gt;Great Fire of 1836&lt;/a&gt;, which destroyed about 10,000 patent records, or after reorganization of the patent office in 1836.&lt;/p&gt;
&lt;p class="p1"&gt;Ruggles was 47 years old and serving in the Congress as a  senator when he was granted Letters Patent No. 1. He is credited with  framing the bill for the reorganization for the United States Patent  Office in 1836.&lt;!-- more --&gt;&lt;/p&gt;
&lt;p class="p1"&gt;Before the reorganization of the patent office, 11,348  patents had been granted, many of which were thought to be worthless  because the Secretary of State didn’t have any power to refuse a patent  for lack of either novelty or usefulness, nor were patent applications  examined on the merit. In a Senate report accompanying Senate Bill No.  239, 24th Congress, 1st Session (28th day of April, 1836), Ruggles  outlined the evils of granting patents without examination. The evils  were that:&lt;/p&gt;
&lt;ul class="ul1"&gt;&lt;li class="li2"&gt;patents were infringing upon one another or on public rights not subject to patent privileges;&lt;/li&gt;
&lt;li class="li2"&gt;the country was being flooded with embarrassing patent monopolies;&lt;/li&gt;
&lt;li class="li2"&gt;lawsuits were being filed at an alarming rate; and&lt;/li&gt;
&lt;li class="li2"&gt;frauds were stemming from sales of speculative patent rights.&lt;/li&gt;
&lt;/ul&gt;&lt;p class="p1"&gt;Afraid of the extent of the evils that would result  from the “unrestrained and promiscous grants of patent privileges”—at  the time patents were being granted at a rate of more than 1,000 a  year—Ruggles recommended that a check be placed on granting of patents  so that only meritorious inventors were granted patents.&lt;/p&gt;
&lt;p class="p1"&gt;174 years later, it’s not clear how well the  reorganization of the patent office has worked, and, woefully, many of  the evils outlined by Ruggles are present today. About 11,348 patents  were granted from 1790 to 1836 [1]. If this amount is spread evenly over  46 years (from 1790 to 1836), then the number of patents per year would  be roughly 236. After the reorganization, from 1836 to 2010, over 7.8  million patents have been granted, about 44,827 patents a year if the  patents are spread evenly over 174 years.&lt;/p&gt;
&lt;p class="p1"&gt;Interestingly, the reorganization of the patent office was  prompted by public outcry. Today, there are murmurings about the need  for reform in patent law, but certainly not public outcry sufficient to  prompt immediate change.&lt;/p&gt;
&lt;p class="p1"&gt;——————————&lt;/p&gt;
&lt;p class="p1"&gt;[1] Patent Laws and System of the United States, New  American Supplement to the latest edition of the Encyclopaedia  Britannica, Volume 4, 1898, page 2312.&lt;/p&gt;&lt;/p&gt;</description><link>http://dewipat.com/post/17684413852</link><guid>http://dewipat.com/post/17684413852</guid><pubDate>Tue, 15 Nov 2011 06:00:00 -0600</pubDate><category>patent</category></item><item><title>US Pat No 8058634</title><description>&lt;a href="http://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20111115&amp;DB=worldwide.espacenet.com&amp;locale=en_EP&amp;CC=US&amp;NR=8058634B2&amp;KC=B2&amp;ND=6"&gt;US Pat No 8058634&lt;/a&gt;: &lt;div class="content_wrap"&gt;
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&lt;p&gt;&lt;span&gt;Method and apparatus for determining sheet position using information from two distinct light beams each at a different position and a different angle, Xin et al., &lt;/span&gt;&lt;span class="s1"&gt;&lt;span&gt;US8058634&lt;/span&gt;&lt;/span&gt;&lt;/p&gt;
&lt;p class="p1"&gt;A method for determining a position of a selected area of a sheet of material relative to a reference plane includes launching a first incident light beam at the selected area of the sheet of material such that the first incident light beam strikes the selected area at a first position and a first angle, thereby producing a first reflected light beam. A second incident light beam is launched at the selected area of the sheet of material such that the second incident light beam strikes the selected area at a second position and a second angle, thereby producing a second reflected light beam. The second position and second angle are different from the first position and first angle, respectively. The first reflected light beam and the second reflected light beam are intercepted at the reference plane. Information related to positions at which the reflected light beams were intercepted and angles at which the incident light beams were launched were received and correlated to the position of the selected area relative to the reference plane.&lt;/p&gt;
&lt;p class="p1"&gt;(165) The patent application of US 8058634 was drafted by the Dewipat Scribe in 2008 and prosecuted by the Dewipat Defender in 2011.&lt;/p&gt;
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&lt;div class="meta"&gt;&lt;/div&gt;</description><link>http://dewipat.com/post/17718644170</link><guid>http://dewipat.com/post/17718644170</guid><pubDate>Tue, 15 Nov 2011 00:00:00 -0600</pubDate><category>work log</category><category>optical measuring</category></item></channel></rss>

